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C16. Commission on Plasma Physics

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Summary of the 25th ICPIG

Toshio Goto
Chairperson of the Local Organizing Committee of the 25th ICPIG
Graduate School of Engineering, Nagoya University, Nagoya, Japan

Masashi Kando
Secretary of the Local Organizing Committee of the 25th ICPIG
School of Engineering, Shizuoka University, Hamamatsu, Shizuoka, Japan

1. Introduction

The International Conference on Phenomena in Ionized Gases (ICPIG) is a traditional international conference with a proud and long history. It covers not only fundamental fields of discharges and plasmas but also many and important application fields of them such as semiconductor processing, surface treatments, pollution control, light source and gaseous lasers. There is no other international conference which includes such the wide range of topics.
The 25th ICPIG was held at Congress Center in Nagoya, Japan, for six days from July 17 (Tue.) to July 22 (Sun.) in 2001. This conference is positioned as a momentous meeting from the historical standpoints of view of the ICPIG. Namely this is the first ICPIG held outside Europe or USA, and just 50th anniversary after the first ICPIG in 1951.

The 25th ICPIG was organized by the Local Organizing Committee (LOC), comprising
representatives of gaseous electronics and plasma communities in Japan. The conference could gather the large number of participants and papers and ended successfully. It is believed that the conference was very significant and fruitful to all participants.

Its summary will be reported here.

2. Participation

The total number of participants at this conference was just 700 including about 170 students, which will be one of the biggest in the past conferences. Table 1 shows the number of participants coming from different countries at 25th ICPIG. The 470 scientists attended from Japan and the 230 scientists attended from 36 other countries all over the world. The data in Table 1 assures that the ICPIG is the real international conference.
The generous support of the sponsors and contributors enabled us to give the large amount of financial supports to many participants from Eastern Europe and developing countries.

Table 1 Number of participants coming from different countries.

Country
Number
Country
Number
Algeria
1
Japan
471
Australia
5
Korea
9
Austria
3
Mexico
4
Belarus
4
Nepal
1
Belgium
2
Netherlands
4
Brazil
1
Norway
1
Bulgaria
1
Philippines
1
China
1
Poland
7
Czech
9
Portugal
6
Denmark
1
Romania
12
Egypt
5
Russia
40
France
16
Slovakia
1
Germany
30
Slovenia
1
Hong Kong
1
UK
13
Hungary
2
Ukraine
11
India
5
USA
17
Iran
4
Uzbekistan
1
Ireland
1
Yugoslavia
3
Italy
6
Total
701


3. Scientific Program

The scientific program consisted of invited talks and poster presentations. Invited talks is classified into two categories, i.e., general lectures reviewing broad fields of interest and topical lectures presenting specialized reviews of topics in the conference. The invited speakers were selected by the ISC from various countries. Eight general lectures and 24 topical lectures were presented in the conference. At the present ICPIG, articles of two pages were requested to the invited speakers. They were included in the conference proceedings together with contributed papers for the convenience of the participants
Originally about 680 contributed papers were submitted to, but some papers were not accepted because of incomplete format of the paper and outside of the subject area of the conference and some authors could not attend the conference. Finally 623 contributed papers were presented in the form of posters during a total four days. The lists of subjects covered at the conference and the number of the contributed papers in each subject areas are shortly summarized in Table 2.
The invited and contributed papers of two pages at the maximum were printed in four volumes (vol.1: July 17, vol.2: July18, vol.3: July 19, vol.4: July 21 and 22) and distributed among the participants at the conference.

Table 2 : Number of posters in each subject areas

Topics
Number of posters
1. Kinetics, thermodynamics, and transport phenomena.
32
2. Elementary processes.
17
3. Low-pressure glows.
40
4. Coronas, sparks, surface discharges and high-pressure glows.
37
5. Arcs.
31
6. High-frequency discharges.
53
7. Ionospheric, magnetospheric, and astrophysical plasmas.
5
8. Plasma diagnostics methods.
49
9. Plasma wall interactions, electrode and surface effects.
20
10. Physical aspects of plasma chemistry, plasma processing of surfaces and thin film technology.
119
11. Generation and dynamics of plasma flows.
14
12. Non-ideal plasmas. Clusters and dusty plasmas.
40
13 Waves and instabilities, including shock waves.
28
14. Nonlinear phenomena, self-organization and chaos.
20
15. Particle and laser beam interaction with plasmas.
15
16. Plasma sources of radiation.
12
17. Numerical modeling.
30
18. Plasma for environmental issues.
29
19. High ionized, low-pressure plasmas (plasma thrusters, ion sources and surface treatment).
24
20. High-pressure, non-thermal plasmas.
8
Total
623


The policy concerning the inclusion of the papers in conference proceedings that at least one of the authors should be registered has been preserved at the 25th ICPIG. Those papers from the proceedings of the 25th ICPIG will appear in the INSPEC database and the Conference Alerts online conference database. The additional copies of the proceedings are available by ordering the LOC.

4. Workshops

Two Conference Workshops on "Advanced Plasma Processing Technologies and Underlying Physics and Chemistry" and "Recent Dusty Plasma Researches in Plasma Physics and Applications" were held in the parallel sessions on July 18 afternoon. The speakers of the workshops were selected among the specialist in the related subjects from many countries by the LOC. The two page articles were included in the conference proceeding of Vol.2. The titles and speakers of the workshops were depicted in the following.

Workshop I:

"Advanced Plasma Processing Technologies and Underlying Physics and Chemistry"
1. J.Tseng-Chung Lee(U.S.A.), Plasma Etching Technologies for Advanced Devices and Structures.
2. M. Matsui(Japan), Mechanism of Highly Selective SiO2 Contact Hole.
3. D. B. Graves(U.S.A.), Molecular Dynamics Simulations of Plasma-Surface Interactions.
4. I. P. Ghanashev(Japan), Production and Control of Planar Microwave Plasmas for Materials Processing.
5. A. Matsuda(Japan), Plasma Aided Deposition of High-Quality Silicon Thin Films for Solar Cells.
6. J. Schmitt(France), Glow Discharge Processing in the Liquid Crystal Display Industry.
7. T. Hammer(Germany), Non-Thermal Plasma Application to the Abatement of Noxious Emissions in Automotive Exhaust Gases.

Workshop II:

" Recent Dusty Plasma Researches in Plasma Physics and Applications "
General Review Talk:
1. D.A.Mendis(USA), Progress in the Study of Dusty Plasma.
Topical Talks :
2. V. E. Fortov(Russia), Coupling and Ordering in Non-ideal Dusty Plasmas.
3. Y. Watanabe(Japan), Nucleation and Subsequent Growth of Clusters in Reactive Plasmas.
4. A. Bouchoule(France), Dust Particles in Processing Plasmas.
5. G. Morfill (Germany), Dust Experiments under Micro-gravity Condition.

5. Social Events

A welcome reception was held in the reception hall of the conference site in the evening of July17. More than 500 participants and accompanying persons joined to it.

The conference banquet was held at Nagoya Tokyu Hotel in the evening of July 19. 260 participants spent the joyful night and deepened their friendship to one another. On July 20, two full-day excursions were carried out for 127 participants including accompanying persons with English speaking guide and lunch. Some tours to several interesting places around Nagoya were carried out for the accompanying persons.

6. von Engel Prize and Poster Prizes

The "von Engel Prize" established in 1998, is sponsored by the "Hans von Engel and Gordon Francis Fund" and administered by the Board of the Faculty of Physical Sciences, University of Oxford. The prize, consisting of $1000 and a certificate, is awarded every two years to an individual for work in the field of physics and technology of plasmas and ionized gases, as covered by ICPIG meetings. Selection is based on either long-standing and important contributions to the field, or an outstanding achievement giving new impulse to the field, or both. This time the von Engel Prize was awarded to Prof.U.Kogelschatz who made a special lecture entitled "Industrial Innovation Based on Fundamental Physics" in the morning of July 22.

Poster prizes started from the 23rd ICPIG in Toulouse, 1997 to award distinguished contributed papers in the field of experiment, theory and computer simulation, based on rigorous valuation by a jury selected by the ISC. The winners of 25th ICPIG were as follows:
Experimental work: T. Tatsumi (Japan)
Theoretical work: F. Sigeneger (Germany)
Numerical simulation: T. Haruki (Japan)

7. Sponsors and Contributors

It is greatly owing to the supports of our sponsors and contributors that the 25th ICPIG was held very successfully by getting so many participants and papers and making fruitful discussions to one another. We gratefully acknowledge the following organizations for their supports.

Sponsors:
The Japan Society of Applied Physics
The Physical Society of Japan
The Institute of Electrical Engineers of Japan
The Japan Society of Plasma and Nuclear Fusion Research
The International Union of Pure and Applied Physics (IUPAP)
Co-sponsor:
Nagoya Industrial Science Research Institute
Cooperative Societies:
Science Council of Japan and other 36 academic societies
Contributors:
Aichi Prefecture Government and other 40 organizations including many companies

8. The 26th ICPIG

The next 26th ICPIG will be held in Greifsvald, Germany, July, 2003. We are looking forward to seeing you there.

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